iH Dry Vacuum Pumps

• Load Lock
• Transfer
• Metrology
• Lithography
• PVD Process
• PVD Pre-clean
• RTA
• Strip/Ashing
• Etching
• Implant Source
• HDP CVD
• RTP
• SACVD
• MCVD
• PECVD
• LPCVD
• ALD

• Optimized utilities consumption
• No preventative maintenance required
• Cantilevered shafts and specially profiled rotors for better handling of particles
• Reserve motor power also maximizes reliability on harsh-duty CVD applications
• Corrosion resistant materials allow pumping of corrosive gases
• Higher operating temperatures provide ample margin to prevent gas condensation
• The one-piece shaft eliminates the need for a motor coupling and a fifth pumping stage removes the need for a silencer and eliminates particle accumulation, both reducing the overall footprint

Edwards advanced semiconductor vacuum pumps have been field-proven to perform to the highest operating standards. Reliability and high performance are achieved by extending service life, improving uptime and increasing productivity, while minimizing footprint and cost of ownership. 
  

The iH Series offers high reliability for difficult processes, such as PECVD and LPCVD, where particulate, condensable and corrosive by-products are present.

• iH80
• iH160
• iH600
• iH1000
• iH1800
• iH1800HTX